Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound

A composition for film formation comprising:

• a compound comprising a group represented by formula (1);
• and
• a solvent:
• wherein in the formula (1),
• R1 to R4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, and optionally at least part of R1 to R4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which the at least part of R1 to R4 bond,
• Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms,
• n is an integer of 0 to 9,
• R5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, and optionally in a case in which n is 2 or greater, a plurality of R5s taken together represent a ring structure having 4 to 20 ring atoms together with a carbon chain to which the plurality of R5s bond,
• in the case in which n is 2 or greater, a plurality of R5s are identical or different, and
• * denotes a binding site to a moiety other than the group represented by the formula (1) in the compound.