Novel approach for ultra thin-film transfer and handling

A method for forming a pellicle apparatus, the method comprising:

• providing a device substrate having one or more pellicle layers defined over a base device layer;
• forming a release layer over the one or more pellicle layers;
• providing a transparent carrier substrate;
• forming an adhesive layer over the transparent carrier substrate;
• bonding the adhesive layer to the release layer, therein defining a composite substrate comprised of the device substrate and carrier substrate;
• removing the base device layer from the composite substrate;
• attaching a pellicle frame to an outermost surface of the one or more pellicle layers;
• isolating a pellicle region from a remainder of the composite substrate, wherein the pellicle region is associated with an outer perimeter of the pellicle frame;
• performing an ablation of the release layer through the transparent carrier substrate, therein defining the pellicle apparatus comprising a pellicle film attached to the pellicle frame;
• and
• separating the pellicle apparatus from a remaining portion of the composite substrate.

An extreme ultraviolet (EUV) lithography system, comprising:

• an EUV radiation source;
• a lithographic reticle having a pattern formed thereon;
• a target apparatus configured to support a target substrate, wherein the EUV radiation source, lithographic reticle, and target apparatus are arranged such that EUV radiation source is configured to expose the target substrate with an image associated with the pattern on the lithographic reticle;
• and
• a pellicle apparatus configured to protect the lithographic reticle, the pellicle apparatus comprising:
• a composite structure comprising:
• a first pellicle layer having a first surface and a second surface;
• a second pellicle layer having a third surface and a fourth surface, wherein the third surface interfaces with the second surface of the first pellicle layer;
• and
• a third pellicle layer having a fifth surface and a sixth surface, wherein the fifth surface interfaces with the fourth surface of the second pellicle layer;
• and
• a pellicle frame connected to outer edges of the first surface of the first pellicle layer and configured to mount the composite structure to an extreme ultraviolet (EUV) reticle, wherein the first surface and the sixth surface face opposite directions.