Interchangeable hot filaments cvd reactor

Abstract

A reactor for a hot filament CVD, the reactor may include an array of filaments; a substrate support unit that is configured to support at least one substrate; a chamber that comprises multiple openings; a gas flow control unit that is coupled to the multiple openings and is configured to receive one or more CVD gases and direct the one or more CVD gases at one or more predefined directions within an energizing region formed by the array of filaments; and a movement system that is configured to introduce a movement between the array of filaments and the substrate support unit thereby selectively moving the at least one substrate in the energizing region and out of the energizing region.

Dependencies are inferred from the claim text.