Laser annealing apparatus and laser annealing method for substrate

A laser annealing method for substrate, comprising:

• providing a laser annealing apparatus which comprises a carrying platform with a fixing surface, a laser source, and a driving device;
• fixing a substrate to be annealed on the fixing surface with a center of the substrate coinciding with a center of the fixing surface, wherein the laser source is configured to emit a laser beam toward the fixing surface, the laser beam of the laser source illuminating the substrate and having an illumination area which covers the center of the substrate and extends toward an edge of the substrate, in an extending direction of the illumination area the illumination area having a length which is not less than a maximum distance between the center of the substrate and the edge of the substrate;
• and
• activating the driving device to drive the carrying platform to rotate around the center of the carrying platform in a horizontal plane such that the laser beam scans the whole surface of the substrate.