Magnetic force release for sputtering sources with magnetic target materials

A magnet bar assembly for a rotary target cathode, the magnet bar assembly comprising:

• a support structure;
• a magnet bar structure movably attached to the support structure, the magnet bar structure including a plurality of magnets;
• and
• a positioning mechanism operatively coupled to the support structure and the magnet bar structure, the positioning mechanism configured to move the magnet bar structure between a retracted position and a deployed position;
• wherein the retracted position of the magnet bar structure substantially reduces a magnetic force between the magnets and a magnetic target material of a target cylinder when the magnet bar assembly is inserted into the target cylinder or removed from the target cylinder;
• wherein the deployed position of the magnet bar structure substantially increases the magnetic force between the magnets and the magnetic target material when the magnet bar assembly is in the target cylinder, and allows a magnetic field from the magnet bar structure to penetrate through the magnetic target material.