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US 2019/0056668 A1Published application
Stripping solvents for photosensitive resins
OwnerArnaud BOURDETTEinventor
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Abstract
The present invention relates to the use, as photoresist-stripping solvent, of a mixture of solvents comprising at least two of the following solvents. (S1) a solvent comprising at least one esteramide compound of formula R1OOC-A-CONR2R3 (S2) DMSO (S3) cyclopentanone.
Claims16
A method, comprising stripping a photoresist using a mixture of solvents comprising at least two of the solvents (S1), (S2) and (S3) below:
- (S1) a solvent comprising at least one esteramide compound corresponding to formula (I) below:
- R1OOC-A-CONR2R3 (I)
- wherein:
- R1 is a group selected from saturated or unsaturated, linear or branched, optionally cyclic, optionally aromatic, hydrocarbon-based groups comprising an average number of carbon atoms ranging from 1 to 36,
- R2 and R3, which may be identical or different, are groups selected from saturated or unsaturated, linear or branched, optionally cyclic, optionally aromatic, optionally substituted, hydrocarbon-based groups comprising an average number of carbon atoms ranging from 1 to 36, R2 and R3 together optionally being able to form a ring, which is optionally substituted and/or optionally comprises a heteroatom, and
- A is a linear or branched divalent alkyl group comprising an average number of carbon atoms ranging from 2 to 12,
- (S2) dimethyl sulfoxide DMSO
- (S3) cyclopentanone C5H8O.
5 more elements
A process for selective depositing of a coating on certain zones only of the surface of a substrate, comprising:
- (a) depositing of a film of photoresist on said surface;
- then
- (b) selective irradiation of said film on certain zones only;
- then
- (c) stripping of said film with a stripping solvent,
- wherein said stripping solvent is a mixture of solvents comprising at least two of the solvents (S1), (S2) and (S3) below:
- (S1) a solvent comprising at least one esteramide compound corresponding to formula (I) below:
- R1OOC-A-CONR2R3 (I)
- wherein:
- R1 is a group selected from saturated or unsaturated, linear or branched, optionally cyclic, optionally aromatic, hydrocarbon-based groups comprising an average number of carbon atoms ranging from 1 to 36,
- R2 and R3, which may be identical or different, are groups selected from saturated or unsaturated, linear or branched, optionally cyclic, optionally aromatic, optionally substituted, hydrocarbon-based groups comprising an average number of carbon atoms ranging from 1 to 36, R2 and R3 together optionally being able to form a ring, which is optionally substituted and/or optionally comprises a heteroatom, and
- A is a linear or branched divalent alkyl group comprising an average number of carbon atoms ranging from 2 to 12,
- (S2) dimethyl sulfoxide DMSO
- (S3) cyclopentanone C5H8O.
11 more elements
Dependencies are inferred from the claim text.