Method And System For High-Throughput Defect Inspection Using The Contrast In The Reduced Spatial Frequency Domain

A method for scanning scattering contrast inspection for the identification of defects in an actual pattern block on a sample as compared to a desired pattern block on the sample, the method comprising the steps of:

• a) providing the sample with the actual pattern block, the pattern including absorbing and/or phase-shifting materials, and the sample having repetitions of said pattern block;
• b) providing a light source for generating a light beam for scanning the sample in transmission mode or reflection mode;
• c) illuminating the sample with the light beam and diffracting the light beam according to the actual pattern present on the sample to form a diffracted light beam;
• d) detecting the diffracted light beam in terms of position related intensities with a position sensitive detector;
• e) analyzing detected intensities, and thereby obtaining a diffraction image that is responsive to the actual pattern block on the sample;
• f) repeatedly comparing diffraction images with previously obtained diffraction images thereby determining a trustworthy diffraction image when a first predetermined number of diffraction images out of a second predetermined number of diffraction images are identical, and marking all diffraction images deviating from the trustworthy diffraction image as being related to a pattern block potentially having a defect;
• and
• g) identifying the position of the pattern block potentially having a defect for further inspection of the position on the sample.

A system for scanning scattering contrast inspection for identifying defects in an actual pattern of a sample as compared to a desired pattern of the sample, the system comprising:

• a sample holder for holding the sample having the actual pattern, said pattern comprising absorbing and or phase-shifting materials and the sample carrying periodic repetitions of a pattern block;
• a light source for generating a light beam for scanning the sample in transmission mode or reflection mode by illuminating the sample with the light beam;
• a position sensitive detector for detecting a diffracted light beam in terms of position related intensities thereof;
• a computing device connected to said detector, said computing device being configured:
• to process data for analyzing the intensities detected by said detector and to obtain a diffraction image responsive to the actual pattern block on the sample;
• to calculate a predicted diffraction image of the desired pattern;
• to repeatedly compare the diffraction images with previously obtained diffraction images thereby determining a trustworthy diffraction image when a first predetermined number of diffraction images out of a second predetermined number of diffraction images are identical, and to mark all diffraction images deviating from the trustworthy diffraction image as being related to a pattern block potentially comprising a defect;
• and
• to identify a position of the pattern block potentially comprising a defect for further inspection of the position on the sample.

A method for scanning scattering contrast inspection for identifying defects in an actual pattern block on a sample as compared to a desired pattern block on the sample, the method comprising:

• a) providing the sample with the actual pattern block, the pattern having absorbing and/or phase-shifting materials and the sample carrying periodic repetitions of the pattern block;
• b) providing a defect library with a number of possible defects that may occur for the pattern block and calculating a diffraction image for each possible defect to thereby determine regions of interest in the reconstructed diffraction image which deviate from a reconstructed diffraction image for a defect-free desired pattern block;
• c) providing a light source for generating a light beam for scanning the sample in transmission mode or reflection mode;
• d) illuminating the sample with the light beam, thereby diffracting the light beam according to the actual pattern present on the sample;
• e) detecting the diffracted light beam in terms of position related intensities thereof with a position sensitive detector;
• f) analyzing the detected intensities, and thereby obtaining a reconstructed diffraction image responsive to the actual pattern block on the sample and comparing the reconstructed diffraction image only in the predetermined regions of interest thereby identifying pattern blocks potentially comprising a defect;
• and
• g) identifying a position of the pattern block that potentially comprises a defect for further inspection of the position thereof on the sample.