Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle

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-39. (canceled)

-48. (canceled)

A pellicle for a lithographic apparatus, the pellicle comprising at least one graphene layer forming a freestanding membrane supported by a planar surface of a portion of a substrate on which the graphene layer was grown, the planar surface being located outside of the freestanding membrane when viewed in a direction perpendicular to the planar surface.

-52. (canceled)

(canceled)

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-90. (canceled)

A method of manufacturing a pellicle for a lithographic apparatus, the method comprising:

• depositing at least one layer of a two-dimensional material on a planar surface of a substrate of the pellicle, wherein the substrate comprises a first substrate portion and a second substrate portion;
• and
• removing the first substrate portion to form a freestanding membrane from the at least one layer of a two-dimensional material, the freestanding membrane being supported by the second substrate portion.