Method for manufacturing a bipolar junction transistor
AssigneeInfineon Technologies Dresden GmbH
InventorsDirk MANGER, Stefan TEGEN
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AssigneeInfineon Technologies Dresden GmbH
InventorsDirk MANGER, Stefan TEGEN
Estimating the term…
Embodiments provide a method for manufacturing a bipolar junction transistor, comprising: providing a semiconductor substrate comprising a buried layer of a first conductive type; doping the semiconductor substrate in a collector implant region, to obtain a collector implant of the first conductive type extending parallel to a surface of the semiconductor substrate and from the surface of the semiconductor substrate to the buried layer; providing a base layer of a second conductive type on the surface of the semiconductor substrate, the base layer covering the collector implant; providing a sacrificial emitter structure on the base layer, wherein a projection of an area of the sacrificial emitter structure is enclosed by an area of the collector implant; and partially counter doping the collector implant through an area of the base layer surrounding an area of the base layer that is covered by the sacrificial emitter structure.
1-20. (canceled)
A bipolar transistor, comprising:
A method comprising:
Dependencies are inferred from the claim text.