High-throughput batch porous silicon manufacturing equipment design and processing methods

A bath-in-bath batch processing apparatus for producing porous semiconductor on a plurality of semiconductor wafers, comprising:

• an electrolyte-filled outer housing;
• an electrolyte-filled inner housing removable from said outer housing, said inner housing operable to open and close, and forming a seal when closed;
• an anode disposed at a first end of said inner housing;
• a cathode disposed at an opposite end of said inner housing, said anode and said cathode coupled to electrical circuitry capable of providing an electrical power comprising electrical voltage and current;
• a plurality of semiconductor wafers arranged between said anode and said cathode, wherein each said wafer is held in place by a peripheral wafer clamp disposed around a peripheral of said wafer, said peripheral wafer clamp allowing substantially all of a front and a back surface of each said wafer exposure to said electrolyte;
• a plurality of vent ports in said inner housing for allowing evolved hydrogen gas to escape, said vent ports extending beyond a surface of said electrolyte to prevent current leakage through said vent ports;
• and
• a plurality of fluid fill ports in said inner housing for replenishing said electrolyte and sweeping said hydrogen gas away from said plurality of wafers.