Method for cleaning chamber, method for treating substrate, and apparatus for treating substrate
AssigneeSemes Co., Ltd.
InventorsJinwoo JUNG, Young Hun LEE
Life of this patent
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Abstract
An apparatus and a method for cleaning a chamber are provided. A method for cleaning a chamber having a treatment space for treating a substrate includes cleaning the chamber by supplying a cleaning medium into the treatment space. The cleaning medium includes a supercritical fluid having a non-polar property and an organic solvent having a polar property. The cleaning efficiency of the chamber is improved with respect to a non-polar contaminant and a polar contaminant.
Claims21
A method for cleaning a chamber having a treatment space for treating a substrate, the method comprising:
- cleaning the chamber by supplying a cleaning medium into the treatment space,
- wherein the cleaning medium includes a supercritical fluid having a non-polar property and an organic solvent having a polar property.
A method for treating a substrate, the method comprising:
- cleaning an inner part of a chamber having a treatment space therein;
- and
- treating the substrate by supplying a supercritical fluid into the treatment space,
- wherein the cleaning of the inner part of the chamber includes:
- cleaning the chamber by supplying a cleaning medium to the treatment space, and
- wherein the cleaning medium includes a supercritical fluid having a non-polar property and an organic solvent having a polar property.
An apparatus for treating a substrate, the apparatus comprising:
- a chamber having a treatment space therein;
- a fluid supply line connected with the chamber and configured to supply a supercritical fluid having a non-polar property into the treatment space;
- and
- a solvent supply unit configured to supply an organic solvent, which has a polar property, into the treatment space.
Dependencies are inferred from the claim text.