Sputter target backing plate assemblies with cooling structures
AssigneeHoneywell International Inc.
InventorsSusan D. Strothers, Kevin B. Albaugh, Stephane Ferrasse
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AssigneeHoneywell International Inc.
InventorsSusan D. Strothers, Kevin B. Albaugh, Stephane Ferrasse
Estimating the term…
A method of forming a monolithic backing plate comprising using additive manufacturing to form a three dimensional structure of continuous material including forming a substantially planar first side in a first plane, forming a plurality of flow barriers joined to the first side, the plurality of flow barriers having a thickness in a direction perpendicular to the first plane; forming a plurality of flow channels defined between the plurality of flow barriers; and forming a substantially planar second side in the first plane, and uniformly solidifying the material such that the backing plate comprises a uniform, continuous material structure throughout the first side, the plurality of flow barriers, and the second side.
1-10. (canceled)
A method of forming a monolithic backing plate for use with a sputtering target, the method comprising:
A method of forming a sputtering target backing plate of continuous material using additive manufacturing, the method comprising:
A sputtering target backing plate comprising:
Dependencies are inferred from the claim text.