Processing method in processing apparatus using halogen-based gas
AssigneeTokyo Electron Limited
InventorsTomohito MATSUO, Hiroshi NAGAIKE
Life of this patent
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Abstract
A processing apparatus performs a predetermined process on an object to be processed by supplying halogen-based gas into a chamber in which a vacuum is maintained, to which chamber a member having an oxide film formed on a surface thereof is connected, or which chamber has an oxide film formed on a surface thereof, wherein the predetermined processing is performed on the target object once or a plurality of times in the chamber. Later, oxygen gas or dry air is supplied to the chamber to purge the chamber, and then the chamber is opened and exposed to the atmosphere.
Claims13
A processing method in a processing apparatus, using a halogen-based gas, which performs a process on a target object by supplying a halogen-based gas into a chamber maintained in a vacuum state, the chamber having an oxide film on a surface thereof or being connected to a member having an oxide film on a surface thereof, the method comprising:
- performing the process on a target object in the chamber once or multiple times;
- purging the chamber by supplying oxygen gas or dry air into the chamber;
- and
- exposing the chamber to the atmosphere.
A processing method in a processing apparatus, using a halogen-based gas, which performs a process on a target object by supplying a halogen-based gas into a chamber while maintaining the chamber in a vacuum state, the chamber having an oxide film on a surface thereof or being connected to a member having an oxide film on a surface thereof, the method comprising:
- performing the process on a target object in the chamber once or multiple times;
- processing an inside of the chamber by an oxygen plasma;
- and
- exposing the chamber to the atmosphere.
A processing method in a processing apparatus, using a halogen-based gas, which performs a process on a target object by supplying a halogen-based gas into a chamber maintained in a vacuum state, the chamber having an oxide film on a surface thereof or being connected to a member having an oxide film on a surface thereof, the method comprising:
- performing the process on a target object in the chamber multiple times while maintaining the chamber in a vacuum state;
- and
- performing idling between the processes performed multiple times,
- wherein during said idling, oxygen gas or dry air is supplied into the chamber to purge the chamber.
Dependencies are inferred from the claim text.