Thermal budget enhancement of a magnetic tunnel junction
AssigneeIntel Corporation
InventorsTofizur RAHMAN, Christopher J. WIEGAND, Daniel B. BERGSTROM
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AssigneeIntel Corporation
InventorsTofizur RAHMAN, Christopher J. WIEGAND, Daniel B. BERGSTROM
Estimating the term…
Embodiments of the disclosure are directed to a magnetic tunneling junction (MTJ) that includes a diffusion barrier. The diffusion barrier can be disposed between two ferromagnetic layers of the MTJ. More specifically, the diffusion barrier can be disposed between a first ferromagnetic layer, which is adjacent to a natural antiferromagnetic layer, and a second ferromagnetic layer; the first and second ferromagnetic layers and the diffusion barrier being part of a synthetic antiferromagnet. The diffusion barrier can be made of a refractory metal, such as tantalum. The diffusion barrier acts as a barrier for manganese diffusion from the natural antiferromagnetic layer into the synthetic antiferromagnet and other higher layers of the MTJ.
A magnetic tunneling junction (MTJ) stack comprising:
A method of creating a magnetic tunneling junction (MTJ) stack, the method comprising:
A computing device comprising:
Dependencies are inferred from the claim text.