Method and apparatus to correct for patterning process error

A system comprising:

• a hardware processor system;
• and
• a non-transitory computer readable storage medium storing machine-readable instructions, wherein when executed, the machine-readable instructions cause the processor system to:
• model high resolution patterning error information of a patterning process involving a patterning device in a patterning system using an error mathematical model;
• model a correction of the patterning error that can be made by a patterning device modification tool using a correction mathematical model, the correction mathematical model having substantially the same resolution as the error mathematical model;
• and
• determine modification information for modifying the patterning device using the patterning device modification tool by applying the correction mathematical model to the patterning error information modeled by the error mathematical model.

A non-transitory computer program product comprising machine-readable instructions configured to cause a processor system to at least:

• model high resolution patterning error information of a patterning process involving a patterning device in a patterning system using an error mathematical model;
• model a correction of the patterning error that can be made by a patterning device modification tool using a correction mathematical model, the correction mathematical model having substantially the same resolution as the error mathematical model;
• and
• determine modification information for modifying the patterning device using the patterning device modification tool by applying the correction mathematical model to the patterning error information modeled by the error mathematical model.