Metrology parameter determination and metrology recipe selection
AssigneeASML Netherlands B.V.
InventorsNarjes JAVAHERI, Mohammadreza HAJIAHMADI, Olger Victor ZWIER, Gonzalo Roberto SANGUINETTI
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Abstract
A method of determining a patterning process parameter from a metrology target, the method including: obtaining a plurality of values of diffraction radiation from the metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target; and using the combination of values to determine a same value of the patterning process parameter for the target.
Claims23
A method of determining a patterning process parameter from a metrology target, the method comprising:
- obtaining a plurality of values of diffraction radiation from the metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target;
- and
- using the combination of values to determine a same value of the patterning process parameter for the target.
A non-transitory computer program product comprising machine-readable instructions for causing a processor to at least:
- obtain a plurality of values of diffraction radiation from a metrology target, each value of the plurality of values corresponding to a different illumination condition of a plurality of illumination conditions of illumination radiation for the target;
- and
- use the combination of values to determine a same value of a patterning process parameter for the target.
Dependencies are inferred from the claim text.