US 2018/0321535 A1 · METHOD FOR PREPARING COLUMN SPACER

Abstract

The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.

Claims10

Dependent claims

A method of preparing a column spacer in which a matrix part and a spacer part protruded from the matrix part are integrally formed, the method comprising irradiating a coated film of a photosensitive resin composition with light using a mask having a pattern, and then performing development,

wherein the mask comprises (1) a first pattern for forming the spacer part;
(2) a second pattern for forming the matrix part, the second pattern being positioned adjacent to the first pattern and having lower light transmittance than the first pattern;
and (3) a third pattern positioned at a boundary between the first pattern and the second pattern, the third pattern having lower light transmittance than the second pattern, and
a valley recessed from the matrix part is formed at a boundary between the matrix part and the spacer part of the column spacer by the third pattern of the mask.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

15/774,426Filed 28 Sep 2016

Priority

KR 10-2015-016230019 Nov 2015

Published

8 Nov 2018

Term ends

Not estimatedThe source records don’t support an estimate.

Classification9 codes

G02F 1/13394
Gaskets; Spacers; Sealing of cells: spacers regularly patterned on the cell subtrate, e.g. walls, pillars
G03F 1/50
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles…
G03F 7/0007
Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor: filters, e.g.…
G03F 7/027
Photosensitive materials: non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Method for preparing column spacer

Life of this patent

Method for preparing column spacer

Life of this patent

Abstract

Claims10