Method for Preparing Graphene Modified Composite Planar pH Sensor

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, the fabrication details of Sb layer as follows:

• the method is RF magnetron sputtering, the target material is antimony, and the shielding gas is argon;
• the sputtering is completed at room temperature, the time is 40˜50 min, the flow is 39 sccm, the vacuum is 3×10−4 Pa, the power is 65 W, and the process pressure is 1 Pa.

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, the fabrication details of Sb2O3 layer as follows:

• the target material is antimony, and the shielding gas is argon, also the oxygen gas is added, the concentration ratio of argon and oxygen is 8:2, and the deposition time is 50 min.

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, the fabrication details of Ag layer as follows:

• the method is RF magnetron sputtering, the target material is silver, and the shielding gas is argon;
• the sputtering is completed at room temperature, the time is 20˜30 min, the flow is 30 sccm, the vacuum is 3×10−4 Pa, the power is 18 W, and the process pressure is 1 Pa.

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, the concentration of the used ferric chloride solution is 0.1 mol/L, and the soak time is 30 s.

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, the thickness of the Sb layer is 230˜250 nm, the Sb2O3 layer 40˜60 nm, and the Nafion layer 1.5˜1.9 μm.

The fabrication method of a composite planar pH sensor modified by graphene film according to claim 8, wherein, the thickness of the Ag layer is 140˜160 nm, the AgCl layer 15˜25 nm, and the Ag layer is not covered with AgCl layer completely.