Edge structure for multiple layers of devices, and method for fabricating the same
AssigneeMacronix International Co., Ltd.
InventorChin-Cheng Yang
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AssigneeMacronix International Co., Ltd.
InventorChin-Cheng Yang
Estimating the term…
An edge structure for multiple layers of devices including stacked multiple unit layers includes first and second stair structures. The first stair structure is at a first direction of the devices where device contacts are formed, including first edge portions of the unit layers at the first direction, of which the borders gradually retreat with increase of level height. The elevation angle from the border of the first edge portion of the bottom unit layer to that of the top one is a first angle. The second stair structure includes second edge portions of the unit layers at a second direction. The variation of border position of the second edge portion with increase of level height is irregular. The elevation angle from the border of the second edge portion of the bottom unit layer to that of the top one is a second angle larger than the first angle.
An edge structure for multiple layers of devices, wherein the multiple layers of devices comprises a plurality of unit layers being stacked, comprising:
(canceled)
A method for fabricating an edge structure for multiple layers of devices, comprising:
Dependencies are inferred from the claim text.