Substrate processing device and substrate processing method

A substrate processing device, comprising:

• a holding member having an upper surface opposed to a lower surface of a substrate with a clearance to hold said substrate horizontally from below, being rotatable around a predetermined rotation axis;
• a rotating mechanism rotating said holding member around said rotation axis;
• and
• a nozzle having a processing solution discharging port and a cleaning liquid discharging port, wherein
• said processing solution discharging port discharges a processing solution from below a central part of the lower surface of said substrate toward the central part;
• and
• said cleaning liquid discharging port discharges a cleaning liquid from between the central part of said substrate and the central part of said holding member in a direction toward outside of said holding member in a radial direction of said holding member, the direction also along an upper surface of said holding member.

A substrate processing device comprising:

• a holding member having an upper surface opposed to a lower surface of a substrate with a clearance to hold said substrate horizontally from below, being rotatable around a predetermined rotation axis, and including a disk-shaped base defining a central axis coincident with said rotation axis and a flange portion protruding outward from a peripheral wall portion of said base in a radial direction;
• a rotational drive rotating said holding member around said rotation axis;
• a guard having a cylindrical shape including an upper end side part that extends obliquely upward toward said rotation axis to surround a periphery of said holding member, being movable upward and downward;
• a processing solution discharging portion capable of discharging a processing solution to a to-be-processed surface of said substrate;
• a cleaning liquid discharging portion capable of discharging a cleaning liquid to said flange portion from below said flange portion of said holding member;
• an elevation drive capable of moving said guard upward and downward between an upper position where said guard can receive said processing solution supplied from said processing solution discharging portion to said substrate and then discharged from said substrate and a lower position where an upper end of said guard is placed on a side of said flange portion;
• and
• a controller controlling said elevation drive, said processing solution discharging portion and said cleaning liquid discharging portion,
• wherein while making said elevation drive dispose said guard in said lower position, said controller makes said cleaning liquid discharging portion discharge said cleaning liquid toward said flange portion of said holding member which holds said substrate while rotating.

A substrate processing method comprising:

• a holding step of holding a substrate with a substrate holding portion having a flange portion;
• a rotation step of rotating said substrate;
• a supplying step of supplying a processing solution to said substrate;
• a receiving step of receiving said processing solution with a guard;
• and
• a cleaning step of cleaning said processing solution adhered to said guard by supplying a cleaning liquid to said flange portion from below said flange portion.