Vapor deposition mask, frame-equipped vapor deposition mask, and method for producing organic semiconductor element

A method for manufacturing a vapor deposition mask provided with a resin mask having at least one opening hole comprising:

• preparing a resin plate having a first surface and an opposed second surface;
• and
• irradiating a laser beam to the resin plate to perforate the resin plate with the at least one opening hole in order to form the resin mask;
• wherein each inner wall surface for composing the individual opening hole includes at least one inflection point in a section along a thickness direction of the resin plate,
• the at least one inflection point being positioned between a first intersection and a second intersection, with a proviso that the first intersection is a point at which the first surface and the inner wall surface are intersected and the second intersection is another point at which the second surface and the inner wall surface are intersected in the section along the thickness direction,
• an angle (θ1) being larger than another angle (θ2), with a proviso that the angle (θ1) is formed between the first surface and a straight line connecting the first intersection and the inflection point, and the angle (θ2) is formed between the second surface and an imaginary extension of another straight line connecting the inflection point and the second intersection, in the section along the thickness direction, and
• at least a part of the inner wall surface is inclined radially expansively from the first surface toward the second surface in the section along said thickness direction.