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US 2018/0026186 A1Published application
Nanoparticle with plural functionalities, and method of forming the nanoparticle
AssigneeInternational Business Machines Corporation
InventorsQing CAO, Kangguo CHENG, Zhengwen LI, Fei LIU
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Abstract
A method of forming a nanoparticle includes forming a layer of semiconductor material on a substrate, forming a first layer on the semiconductor material, and etching the semiconductor layer to form the nanoparticle including the first layer on a first side of the nanoparticle and the semiconductor material on a second side of the nanoparticle.
Claims20
A method of forming a nanoparticle, comprising:
- forming a layer of semiconductor material on a substrate;
- forming a first layer on the semiconductor material;
- and
- etching the semiconductor layer to form the nanoparticle including the first layer on a first side of the nanoparticle and the semiconductor material on a second side of the nanoparticle.
1 more element
A nanoparticle comprising:
- a cuboid base comprising a semiconductor material;
- and
- a plurality of surfaces formed on the base and including a plurality of functionalities, respectively.
Dependencies are inferred from the claim text.