Image sensor device and method of forming same

An image sensor device, comprising:

• a first substrate including a pixel region and a circuit region;
• an interconnect structure arranged over the first substrate, the interconnect structure including plurality of metal layers stacked over one another and extending over the pixel region and the circuit region;
• a conductive layer arranged over the interconnect structure, the conductive layer including a solid layer of conductive material which extends over the pixel region and circuit region without any through-holes over the pixel region or over the circuit region;
• a second substrate arranged over the conductive layer;
• a conductive re-routing layer arranged over the second substrate;
• and
• a conductive via passing through the second substrate electrically coupling the conductive re-routing layer to the conductive layer, the conductive via being arranged over the pixel region.

An image sensor device, comprising:

• a first substrate including a pixel region and a circuit region;
• an interconnect structure arranged over the first substrate, the interconnect structure including plurality of metal layers stacked over one another and extending over the pixel region and the circuit region;
• a conductive layer arranged over the interconnect structure;
• a second substrate arranged over the conductive layer;
• a conductive re-routing layer arranged over the second substrate;
• and
• a conductive via passing through the second substrate electrically coupling the conductive re-routing layer to the conductive layer, the conductive via being arranged over the pixel region.