Imaging element and method of manufacturing the same

An imaging device comprising:

• a substrate having at least a first photoelectric conversion element and a second photoelectric conversion element disposed therein;
• a charge accumulation unit disposed between the first photoelectric conversion element and the second photoelectric conversion element, the charge accumulation unit receiving a charge amount from the first photoelectric conversion element;
• a first light-shielding section disposed between the charge accumulation unit and the first photoelectric conversion element;
• a second light-shielding section disposed between the charge accumulation unit and the second photoelectric conversion element;
• a third light-shielding section arranged at a light incident surface of the substrate and in a path of incident light traveling toward the charge accumulation unit.

An imaging device comprising:

• a substrate having at least a first photoelectric conversion element and a second photoelectric conversion element disposed therein;
• a charge accumulation unit disposed between the first photoelectric conversion element and the second photoelectric conversion element, the charge accumulation unit receiving a charge amount from the first photoelectric conversion element;
• a first light-shielding section disposed between the charge accumulation unit and the first photoelectric conversion element;
• a second light-shielding section disposed between the charge accumulation unit and the second photoelectric conversion element;
• a floating gate;
• a floating diffusion region;
• and
• a reset gate,
• wherein each of the floating gate, the floating diffusion region, and the reset gate are disposed between the first light shielding section and the second light shielding section.