Systems and methods for sensing process parameters during semiconductor device fabrication

A semiconductor device fabrication system comprising:

• a semiconductor fabrication tool having an integrated interface that measures a first process parameter of the semiconductor fabrication tool;
• a sensor controller configured to receive and identify a wireless signal associated with the semiconductor fabrication tool, to receive the first process parameter, and to form mixed data from the wireless signal and first process parameter;
• and
• a tool controller configured to receive data from the integrated interface and the sensor controller, to assign a unique system variable identifier (SVID) to data from the sensor controller, and to contextualize the data in data packets.

A method for fabricating a semiconductor device, the method comprising:

• providing a semiconductor fabrication tool having an integrated interface that measures a first process parameter of the semiconductor fabrication tool and having a tool controller configured to receive data from the integrated interface;
• coupling a sensor controller to the tool controller;
• mounting a wireless sensor to measure a second process parameter of the fabrication tool;
• measuring a first semiconductor fabrication process parameter of the semiconductor fabrication tool using the integrated interface of the fabrication tool;
• communicating a first signal from the integrated interface to the tool controller;
• measuring a second semiconductor fabrication process parameter of the fabrication tool using the wireless sensor that is mounted to the fabrication tool;
• communicating a second signal from the wireless sensor to the sensor controller;
• transmitting the second signal from the sensor controller to the tool controller;
• and
• contextualizing data from the first signal and data from the second signal in the tool controller.