Plasma processing apparatus and analysis method for analyzing plasma processing data

A plasma processing apparatus comprising:

• a processing chamber configured to perform processing using plasma;
• and
• an analysis unit configured to analyze data of light emitted from the plasma,
• wherein the analysis unit obtains wavelengths of the light correlated with a plasma processing result, selects, from the obtained wavelengths, a wavelength having a first factor that represents a deviation in an intensity distribution of the light and is larger than a first predetermined value, and predicts the plasma processing result using the selected wavelength, or
• the analysis unit obtains values computed using each of light intensities of a plurality of wavelengths and correlated with the plasma processing result, selects, from the obtained values, a value having a second factor that represents a deviation in a distribution of the obtained values and is larger than a second predetermined value, and predicts the plasma processing result using the selected value.