Active eye-to-eye with alignment by x-y capacitance measurement

A photolithography system, comprising:

• a slab;
• a chuck disposed on the slab;
• a plurality of image projection systems disposed over the slab, wherein each image projection system of the plurality of image projection systems includes a lens, wherein the lens includes a lens housing;
• one or more targets coupled to the lens housing of the lens of each image projection system;
• and
• a plate disposed between the slab and the plurality of image projection systems, wherein the plate includes a plurality of openings and one or more sensors disposed adjacent to each opening of the plurality of openings.

A method, comprising:

• moving a substrate under a plurality of image projection systems, wherein each image projection system of the plurality of image projection systems includes a lens;
• extending the lens towards the substrate disposed on a chuck, wherein the lens is extended through an opening formed in a plate, wherein the plate is disposed between the substrate and the plurality of image projection systems, wherein the plate includes one or more elements disposed adjacent to the opening;
• and
• measuring one or more distances between the lens and the one or more elements.