Electron beam inspection apparatus and electron beam inspection method

An electron beam inspection apparatus comprising:

• a stage configured to mount a substrate to be inspected thereon and to be continuously movable;
• an electron beam column configured, while the stage continuously moves in a predetermined direction, to scan the substrate by irradiating the substrate with multi-beams composed of a plurality of first electron beams in a plurality of beam rows, in each of which corresponding beams of the plurality of first electron beams are arranged at a same pitch in a straight line, such that a center of each of irradiation regions irradiated with the multi-beams does not overlap with other irradiation regions of the irradiation regions in a direction parallel to a movement direction of the stage;
• and
• a detector configured to detect a secondary electron emitted from the substrate due to irradiation of the multi-beams on the substrate, wherein
• the electron beam column scans the substrate by deflecting the multi-beams such that a size in the movement direction of the stage, with respect to each of deflection regions for deflecting the multi-beams, differs from a size in a direction orthogonal to the movement direction of the stage.