Measurement of porous film
AssigneeNDC Technologies, Inc.
InventorsKevin Paul HUMPHREY, Robert Peter HAMMOND
Life of this patent
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AssigneeNDC Technologies, Inc.
InventorsKevin Paul HUMPHREY, Robert Peter HAMMOND
Estimating the term…
A method of calculating a first parameter of a first sample of a material is provided. The method includes determining a first and second wavelengths at which the material exhibits substantially no absorption; measuring a transmission of the first sample at the first wavelength; measuring a transmission of the first sample at the second wavelength; and calculating the first parameter of the first sample using a first multivariate regression model including first regression coefficients. The first parameter is a parameter which affects a total amount of radiation scattered by the first sample at the first and second wavelengths.
A method of calculating a first parameter, S, of a first sample of a material, the method comprising:
A method of calculating a first parameter, S, of a first sample of a material, the method comprising:
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