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AssigneeKLA-Tencor Corporation
InventorsTal Marciano, Michael E. Adel, Mark Ghinovker, Barak Bringoltz, Dana Klein, Tal Itzkovich, Vidya Ramanathan, Janay Camp
Estimating the term…
Method, metrology modules and RCA tool are provided, which use the behavior of resonance region(s) in measurement landscapes to evaluate and characterize process variation with respect to symmetric and asymmetric factors, and provide root cause analysis of the process variation with respect to process steps. Simulations of modeled stacks with different layer thicknesses and process variation factors may be used to enhance the analysis and provide improved target designs, improved algorithms and correctables for metrology measurements. Specific targets that exhibit sensitive resonance regions may be utilize to enhance the evaluation of process variation.
A method comprising:
A RCA (root cause analysis) tool associated with at least one computer processor and configured to receive process related parameters and measurement data, and derive therefrom a landscape and at least one resonance region in the landscape, wherein the landscape comprises a dependency of at least one metrology metric on at least one parameter and the at least one resonance region corresponds to a resonance of optical illumination in a measured location, the RCA tool further configured to evaluate a process variation from an analysis of changes in the at least one resonance region in the landscape with respect to the received process related parameters and measurement data.
Dependencies are inferred from the claim text.