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US 2018/0023195 A1Published application
Method to improve precursor utilization in pulsed atomic layer processes
OwnerTriratna P. Muneshwar, Ken Cadieninventors
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Abstract
A method and system is provided to improve precursor utilization in pulsed atomic layer processes. The system integrates a chiller with a precursor ampoule to lower the temperature of the precursor ampoule, and thereby reduce the precursor vapor pressure. By lowering the ampoule temperature, the loss of excess unreacted precursor molecules is reduced, in order to improve precursor utilization efficiency in atomic layer processes.
Claims19
A method for efficient precursor utilization in an atomic layer process comprising:
- lowering the temperature of a precursor ampoule;
- and
- delivering precursor molecules from said precursor ampoule at said lower temperature into an atomic layer process reactor.
A precursor delivery system comprising:
- a precursor ampoule;
- said ampoule having
- a chiller enclosing said precursor ampoule;
- and
- a fast switching valve in fluid communication with said precursor ampoule and a precursor delivery line.
2 more elements
Dependencies are inferred from the claim text.