A method and system for high temperature clean

A method of cleaning, comprising:

• raising a substrate on a plurality of lift pins, wherein the lift pins extend through a substrate support disposed in a processing chamber, to expose a space between the substrate and the substrate support;
• supplying a halogen containing gas via a gas distribution plate into the processing chamber;
• supplying a second gas through a first opening in the processing chamber;
• flowing the second gas through the space between the substrate and the substrate support during chamber cleaning;
• supplying a third gas through a second opening in the processing chamber, wherein the second opening is orthogonal to the first opening;
• and
• flowing the third gas in the space between the substrate and the substrate support during chamber cleaning.

A method of cleaning, comprising:

• raising a substrate on a plurality of lift pins, wherein the lift pins extend through a substrate support disposed in a processing chamber, to expose a space between the substrate and the substrate support;
• supplying a halogen containing gas via a gas distribution plate into the processing chamber;
• supplying a second gas through a first opening in the processing chamber;
• flowing the second gas through the space between the substrate and the substrate support during chamber cleaning;
• supplying a third gas through a second opening in the processing chamber, wherein the second opening is orthogonal to the first opening;
• and
• flowing the third gas in the space between the substrate and the substrate support during chamber cleaning, wherein the halogen containing gas, the second gas, and the third gas flow simultaneously.