Magnetic-field-generating apparatus for magnetron sputtering
AssigneeHitachi Metals, Ltd.
InventorYoshihiko KURIYAMA
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AssigneeHitachi Metals, Ltd.
InventorYoshihiko KURIYAMA
Estimating the term…
A racetrack-shaped apparatus for generating a magnetic field on a target surface for magnetron sputtering, comprising on a magnetic base (a) a vertically magnetized center permanent magnet arranged straight; (b) vertically magnetized peripheral permanent magnets surrounding the center permanent magnet; (c) vertically magnetized first intermediate permanent magnets, horizontally magnetized second intermediate permanent magnets and vertically magnetized third intermediate permanent magnets arranged on both sides of the center permanent magnet; and (d) vertically magnetized fourth intermediate permanent magnets arranged separately from both longitudinal ends of the center permanent magnet; each second intermediate permanent magnet being arranged with one magnetic pole opposing a near-target side surface portion of each first intermediate permanent magnet.
A racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering comprising a straight portion and corner portions, and opposing a target to generate a magnetic field on a target surface, comprising on a magnetic base
Dependencies are inferred from the claim text.