Mask frame assembly including pattern position adjusting mechanism and pattern position adjusting method using the mask frame assembly

A deposition pattern position adjusting method of a mask frame assembly, the deposition pattern position adjusting method comprising:

• preparing the mask frame assembly comprising:
• a mask comprising a deposition pattern through which a deposition material is deposited to a deposition target,
• a frame to which the mask comprising the deposition pattern is combined,
• a plurality of rotors provided along an edge of the frame, and
• a wire which connects more than one rotor among the plurality of rotors to each other;
• determining a location at which a position of the deposition pattern of the mask is to be adjusted;
• and
• changing tension of the wire by rotating, from among the more than one rotor, a rotor which affects adjustment of the position of the deposition pattern at the determined location.