Imprint apparatus, imprint method, and method of manufacturing article

An imprint method of performing an imprint process of forming a pattern in an imprint material on a substrate using a mold, the method comprising:

• obtaining an image by capturing the substrate in a state in which the mold and the imprint material on the substrate are in contact with each other;
• and
• performing detection processing of detecting a foreign particle present between the mold and the substrate by comparing the image obtained in the obtaining with a reference image,
• wherein when the image obtained in the obtaining includes a region outside the substrate, the region outside the substrate is excluded from a target of a comparison with the reference image.

A method of manufacturing an article, the method comprising:

• forming a pattern on a substrate using an imprint apparatus;
• and
• processing the substrate on which the pattern has been formed, wherein the imprint apparatus configured to form a pattern in an imprint material on the substrate using a mold and includes:
• an image capturing unit configured to obtain an image by capturing the substrate;
• and
• a processing unit configured to perform detection processing of detecting a foreign particle present between the mold and the substrate, wherein the processing unit performs the detection processing by comparing, with a reference image, an image obtained by the image capturing unit in a state in which the mold and the imprint material on the substrate are in contact with each other, and
• when the image includes a region outside the substrate, the region outside the substrate is excluded from a target of the detection processing.