Imprint template, detection method and detection device

A method for detecting imprint quality, applied to a target substrate imprinted by using an imprint template, wherein the imprint template comprises:

• a first region;
• a second region located in the periphery of the first region;
• a first imprint structure provided in the first region and configured to imprint a first film layer pattern into a base material in a product region of the target substrate;
• and a second imprint structure provided in the second region and configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate, the second film layer pattern being used for assessing imprint quality of the first film layer pattern,
• the method comprising steps of:
• measuring shape data of the second film layer pattern on the target substrate;
• determining a completion degree of imprinting the second film layer pattern based on the measured shape data;
• and
• assessing the imprint quality of the first film layer pattern in the product region of the target substrate based on the completion degree of imprinting the second film layer pattern.

A device for detecting imprint quality, applied to a target substrate imprinted by using an imprint template, wherein the imprint template comprises a first region;

• a second region located in the periphery of the first region;
• a first imprint structure provided in the first region and configured to imprint a first film layer pattern into a base material in a product region of a target substrate;
• and a second imprint structure provided in the second region and configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate, the second film layer pattern being used for assessing imprint quality of the first film layer pattern,
• the device comprising:
• a measuring circuit configured to measure shape data of the second film layer pattern on the target substrate;
• a determining circuit configured to determine the completion degree of imprinting the second film layer pattern based on the measured shape data;
• and
• an assessing circuit configured to assess the imprint quality of the first film layer pattern in the product region of the target substrate based on the completion degree of imprinting the second film layer pattern.