Slurry Supply and/or Chemical Blend Supply Apparatuses, Processes, Methods of Use and Methods of Manufacture
AssigneeVersum Materials US, LLC
InventorsGary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer
Life of this patent
Estimating the term…
Abstract
A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
Claims28
A slurry supply apparatus comprising a blend module that combines two or more flowing component streams to form a blended slurry in a pipe, wherein said blend module comprises a blend module pump and a pipe for each component stream and at least one flow controller in each of at least two of the component pipes to control the flow rate of the components and wherein said component pipes are connected and combined into a single pipe to form the blended slurry stream upstream of said blend module pump, and further comprising:
- A) a distribution module comprising at least one distribution module tank and at least one distribution module pump and wherein at least a portion of the blended slurry stream from the blend module flows to the distribution module;
- B) an optional feed module, said feed module comprising at least one feed tank for holding raw slurry, at least one circulation loop and a pump in the at least one circulation loop connected to the at least one feed tank, said pump for pumping said raw slurry from the feed tank through the circulation loop and back to the feed tank, wherein the circulation loop further comprises a pipe that supplies only a portion of the raw slurry from the circulation loop to said blend module when the blend module is blending slurry, said circulation loop further comprises a back pressure controller, and a pressure sensor that measures a pressure in the circulation loop that is used to regulate a valve in said back pressure controller to maintain said raw slurry circulating through all of the circulation loop;
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- C) an optional analytical module in fluid communication with said blend module and wherein at least a portion of the blended slurry from the blend module flows to and is analyzed in said analytical module, said analytical module comprising one or more analytical apparatuses selected from the group consisting of in-line liquid particle counter, particle size distribution analyzer, pH sensor, hydrogen peroxide sensor, density sensor and conductivity sensor.
Dependencies are inferred from the claim text.