Thermal processing device, substrate processing apparatus and thermal processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorYukihiko INAGAKI
Life of this patent
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Abstract
A thermal processing device includes a waiting section, a heating section and a transport mechanism. The waiting section includes a plurality of support pins. The transport mechanism includes a transport arm for holding a substrate and transports the substrate between the waiting section and the heating section by moving the transport arm. The transport arm has a plurality of regions and a plurality of cooling water passages for respectively cooling the plurality of regions are provided in the transport arm.
Claims13
A thermal processing device comprising:
- a heating section in which heating processing is performed on a substrate;
- a waiting section that includes a supporter for supporting the substrate;
- and
- a transporter that includes a holder for holding the substrate and transports the substrate between the waiting section and the heating section by moving the holder, wherein
- the holder has a plurality of regions, and a plurality of cooling portions for respectively cooling the plurality of regions are provided in the holder.
A thermal processing method for performing thermal processing on a substrate, including the steps of:
- supporting the substrate in a waiting section;
- heating the substrate in a heating section;
- and
- transporting the substrate between the waiting section and the heating section by moving a holder for holding the substrate, wherein
- the step of transporting includes respectively cooling a plurality of regions of the holder by a plurality of cooling portions provided in the holder.
Dependencies are inferred from the claim text.