Immersion liquid, exposure apparatus, and exposure process
AssigneeASML Netherlands B.V.
InventorsHans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
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Abstract
An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
Claims19
-20. (canceled)
A lithographic apparatus comprising:
- a membrane impermeable to a liquid and permeable to a gas;
- a liquid inlet configured to supply a flow of the liquid to a first side of the membrane;
- and
- a gas inlet configured to supply to a second side of the membrane a flow of the gas which diffuses through the membrane to dissolve in the liquid,
The apparatus of claim 28, further comprising a voltage generator functionally connected to a first part of the lithographic apparatus, and to a second part of the lithographic apparatus, the voltage generator configured to establish a voltage difference between the first part and the second part. 30, (New) The apparatus of claim 29, wherein (i) the first part is the substrate table and the second part is the liquid confinement structure, and/or (ii) the first part is a sensor or sensor plate and the second part is the liquid confinement structure.
A device manufacturing method comprising transferring a pattern from a patterning device onto a substrate, wherein a liquid is provided on one side of a membrane and a gas is provided on another side of the membrane, wherein the gas diffuses across the membrane to diffuse into the liquid.
A lithographic apparatus comprising:
- a source, or a connection thereto, the source having, in a use, a material configured to acidify a liquid;
- a fluid handling system configured to supply liquid to a first region and to supply the material to a second region adjacent the liquid such that at least part of the material diffuses into the liquid to at least acidify at least part of the liquid;
- and
- a liquid confinement structure configured to confine at least part of the acidified liquid to a space between a projection system of the lithographic apparatus and a table of the lithographic apparatus.
Dependencies are inferred from the claim text.