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US 2018/0003895 A1Published application
Junction region between two waveguides and associated method of production
AssigneeSTMicroelectronics (Crolles 2) SAS
InventorCharles Baudot
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Abstract
A photonic integrated device includes a first waveguide and a second waveguide. The first and second waveguides are mutually coupled at a junction region the includes a bulge region.
Claims15
A photonic integrated device, comprising:
- a semiconductor substrate comprising a first lateral area, a second lateral area, a central area, a first intermediate area that is located between the first lateral area and the central area, and a second intermediate area that is located between the second lateral area and the central area,
- a first waveguide comprising a portion in the first lateral area, and
- a second waveguide comprising a portion in the second lateral area,
- wherein the first and second waveguides are mutually coupled by a junction region comprising a central junction region that is located in the central area, a first intermediate junction region and a second intermediate junction region extending, respectively, into the first and second intermediate areas while gradually widening in order to meet the central junction region so as to form a bulge, and
- wherein the first waveguide comprises a first part produced on a second part that is wider than the first part, and
- wherein the junction region comprises a portion of said second part that extends from the first lateral area into the first intermediate area and into a part of the central area while gradually narrowing until reaching the width of the central junction region.
3 more elements
A method for producing a photonic integrated device comprising two waveguides that are connected to one another by a junction region, the method comprising:
- performing two successive operations of etching a semiconductor substrate,
- wherein a first etching operation of said two successive operations comprises a partial etching of the substrate with the exception of a first area which is masked by a first mask, and
- wherein the second etching operation of said two successive operations comprises a complete etching of the substrate with the exception of the first masked area and a second area which is masked by a second mask, the first etching operation and the second etching operation defining a bulge in the substrate.
A system comprising a photonic integrated device, wherein the photonic integrated device comprises:
- a semiconductor substrate comprising a first lateral area, a second lateral area, a central area, a first intermediate area that is located between the first lateral area and the central area, and a second intermediate area that is located between the second lateral area and the central area,
- a first waveguide comprising a portion in the first lateral area, and
- a second waveguide comprising a portion in the second lateral area,
- wherein the first and second waveguides are mutually coupled by a junction region comprising a central junction region that is located in the central area, a first intermediate junction region and a second intermediate junction region extending, respectively, into the first and second intermediate areas while gradually widening in order to meet the central junction region so as to form a bulge, and
- wherein the first waveguide comprises a first part produced on a second part that is wider than the first part, and
- wherein the junction region comprises a portion of said second part that extends from the first lateral area into the first intermediate area and into a part of the central area while gradually narrowing until reaching the width of the central junction region.
3 more elements
A photonic integrated device, comprising:
- a substrate;
- a first optical waveguide supported by the substrate, said first optical waveguide including a slab portion and a rib portion over the slab portion;
- a second optical waveguide supported by the substrate, said second optical waveguide including a strip portion;
- a junction between the first and second optical waveguides, wherein the junction comprises:
- a narrowing of the slab portion to a junction width;
- a widening of the rib portion to said junction width;
- and
- a widening of the strip portion to said junction width.
5 more elements
Dependencies are inferred from the claim text.