Plasma generator
AssigneeJehara Corporation
InventorHongseub Kim
Life of this patent
Estimating the term…
Abstract
Provided is a plasma generator for improving uniformity of plasma. The plasma generator which includes a pair of source electrode unit 110 and bias electrode unit 120 disposed to face each other in a vacuum chamber and an RF power unit 132 and a bias RF power unit 142 supplying RF power to the source electrode unit 110 and the bias electrode unit 120, respectively, comprises a common contact point cc which is connected with a plurality of contact points cp disposed along the edge of the source electrode unit 110; and an impedance controller 150 which is connected with the common contact point cc to control the impedance.
Claims13
A plasma generator which includes a pair of source electrode unit and bias electrode unit disposed to face each other in a vacuum chamber and an RF power unit and a bias RF power unit supplying RF power to the source electrode unit and the bias electrode unit, respectively, the plasma generator comprising:
- a common contact point which is connected with a plurality of contact points disposed along the edge of the source electrode unit;
- and
- an impedance controller which is connected with the common contact point to control the impedance.
A plasma generator comprising:
- a pair of source electrode unit and bias electrode unit disposed to face each other in a vacuum chamber and an RF power unit and a bias RF power unit supplying RF power to the source electrode unit and the bias electrode unit, respectively,
- wherein the source electrode is inductive coupled plasma, and in the bias electrode unit, a plurality of contact points is disposed along the edge, and the contact points are connected to a common contact point to be connected with an impedance controller controlling the impedance.
A plasma generator which includes a pair of source electrode unit and bias electrode unit disposed to face each other in a vacuum chamber and an RF power unit and a bias RF power unit supplying RF power to the source electrode unit and the bias electrode unit, respectively, the plasma generator comprising:
- a planar capacitor provided with a predetermined width along the edge of the source electrode unit;
- and
- an impedance controller which is connected with the planar capacitor by the contact point to control the impedance.
A plasma generator comprising:
- a pair of source electrode unit and bias electrode unit disposed to face each other in a vacuum chamber and an RF power unit and a bias RF power unit supplying RF power to the source electrode unit and the bias electrode unit, respectively,
- wherein the source electrode is inductive coupled plasma, and the bias electrode unit further includes a planar capacitor provided with a predetermined width along the edge, and
- an impedance controller which is connected with the planar capacitor by the contact point to control the impedance.
Dependencies are inferred from the claim text.