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AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins
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A bulk, sintered solid solution-comprising ceramic article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas and provides advantageous mechanical properties. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide and zirconium oxide. The bulk, sintered solid solution-comprising article is formed from zirconium oxide at a molar concentration ranging from about 96 mole % to about 94 mole %, and yttrium oxide at a molar concentration ranging from about 4 mole % to about 6 mole %.
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A semiconductor processing apparatus, said apparatus having at least one surface exposed to a halogen-comprising plasma during a process, wherein said apparatus comprises a bulk, sintered solid solution ceramic which is resistant to erosion by halogen-containing plasmas, wherein said ceramic is formed from zirconium oxide at a molar concentration ranging from about 96 mole % to about 94 mole %, and yttrium oxide at a molar concentration ranging from about 4 mole % to about 6 mole %.
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A method of reducing the plasma erosion of a semiconductor processing apparatus contacted by a halogen-containing plasma, comprising:
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Dependencies are inferred from the claim text.