Back to results
US 2017/0365562 A1Published application
Patterning graphene with a hard mask coating
AssigneeNanomedical Diagnostics, Inc.
InventorsDENG PAN, BRETT GOLDSMITH
Life of this patent
Estimating the term…
Abstract
Embodiments of the disclosed technology include patterning a graphene sheet for biosensor and electronic applications using lithographic patterning techniques. More specifically, the present disclosure is directed towards the method of patterning a graphene sheet with a hard mask metal layer. The hard mask metal layer may include an inert metal, which may protect the graphene sheet from being contaminated or damaged during the patterning process.
Claims19
A method for patterning graphene comprising:
- placing a graphene sheet on a wafer;
- depositing a metal layer on the graphene sheet;
- depositing a photoresist layer on the metal layer;
- and
- etching a pattern on the photoresist layer to expose the metal layer.
2 more elements
A method for patterning graphene comprising:
- placing a graphene sheet on a wafer;
- depositing a gold layer on the graphene sheet;
- depositing a photoresist layer on the gold layer;
- and
- etching a pattern on the photoresist layer, wherein the pattern on the photoresist layer is etched to be a template for patterning the graphene sheet on the wafer.
2 more elements
Dependencies are inferred from the claim text.