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US 2017/0365443 A1Published application
Gas distribution plate assembly for high power plasma etch processes
AssigneeApplied Materials, Inc.
InventorsJames D. CARDUCCI, Kenneth S. COLLINS, Kartik RAMASWAMY, Michael R. RICE, Richard Charles FOVELL, Vijay D. PARKHE
Life of this patent
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Abstract
A gas distribution plate assembly for a processing chamber is provided that in one embodiment includes a body made of a metallic material, a base plate comprising a silicon infiltrated metal matrix composite coupled to the body, and a perforated faceplate comprising a silicon disk coupled to the base plate by a bond layer.
Claims20
A gas distribution plate assembly, comprising:
- a base plate comprising a metal matrix composite;
- and
- a perforated faceplate comprising a silicon disk coupled to the base plate by a bond layer.
A gas distribution plate assembly, comprising:
- a body;
- a perforated faceplate comprising a silicon disk coupled to the body by a base plate;
- and
- a bond layer disposed between the body and the perforated faceplate.
1 more element
A processing chamber, comprising;
- a gas distribution plate assembly, comprising:
- a base plate comprising a metal matrix composite;
- and
- a perforated faceplate comprising a silicon disk coupled to the base plate by a bond layer;
- and
- a temperature control system coupled to the gas distribution plate assembly.
3 more elements
Dependencies are inferred from the claim text.