Exposure apparatus, method for producing device, and method for controlling exposure apparatus

A liquid immersion exposure apparatus comprising:

• a projection system;
• a liquid supply inlet through which liquid is supplied;
• a first liquid collection outlet;
• a stage which is movable below and relative to the projection system, the liquid supply inlet and the first liquid collection outlet, the stage having a second liquid collection outlet;
• a separator fluidically connected to the first liquid collection outlet, the separator separating one of the liquid and gas, which have been collected through the first liquid collection outlet, from the other, wherein
• a liquid immersion area of the liquid supplied from the liquid supply inlet is formed on a portion of an upper surface of a substrate held by the stage, while performing a liquid supply from the liquid supply inlet and a liquid collection from the first liquid collection outlet,
• the stage is movable to a position at which the liquid immersion area covers the portion of the upper surface of the substrate and an upper surface of the stage,
• the second liquid collection outlet collects a portion of the liquid supplied from the liquid supply inlet which comes from a gap between the upper surface of the substrate and the upper surface of the stage, and
• the substrate is exposed with light from the projection system through the liquid in the liquid immersion area.