Test structure for use in metrology measurements of patterns
AssigneeNova Measuring Instruments Ltd.
InventorsOded COHEN, Gilad BARAK, Igor TUROVETS
Life of this patent
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Abstract
A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region
Claims18
A method for creating a test structure for use in metrology measurements of a sample pattern produced by a predetermined multi-patterning scheme, the method comprising:
- applying a multi-patterning process to a test site for creating a test pattern based on design rules of the sample pattern and configured to enable focusing the metrology measurements on at least one selected feature of the sample pattern, wherein said multi-patterning process applied to the test site either comprises said multi-patterning scheme and at least one additional patterning stage or comprises said multi-patterning scheme while modifying at least one patterning stage of said multi-patterning scheme, such that said multi-patterning process creates in the test site a part of the sample pattern and at least one blocking layer at least partially blocking features of the sample pattern adjacent to said at least one selected feature.
A test structure for use in metrology measurements of a sample pattern, the test structure comprising a test pattern comprising a portion of the sample pattern including at least one selected feature of the sample pattern and a blocking layer at least partially covering regions of the test structure adjacent to said at least one selected region.
Dependencies are inferred from the claim text.