Nozzle head and apparatus for coating substrate surface
AssigneeBeneq Oy
InventorsPekka SOININEN, Olli PEKONEN
Life of this patent
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Abstract
A nozzle head, apparatus and method for providing a coating on a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to principles of atomic layer deposition. The nozzle head comprises an output face provided with at least two different precursor zones, the at least two different precursor zones being arranged to provide different coating layers on the surface of the substrate.
Claims24
1-30. (canceled)
A nozzle head for providing a coating on a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to principles of atomic layer deposition, the nozzle head being arranged to be moved relative to the substrate in a moving direction, the nozzle head comprising:
- an output face via which the at least two precursors are supplied to the surface of the substrate, the output face having a width extending transversely to the relative moving direction of the nozzle head and the substrate and length extending in the relative moving direction of the nozzle head and the substrate;
- and
- two or more precursor zones provided to the output face of the nozzle head and arranged to supply at least two precursors to the surface of the substrate for forming a first coating layer on the surface of the substrate, wherein at least two of the precursor zones have a length in the direction of the with less than the width of the output face and arranged at different locations on the output face of the nozzle head in the direction of the width of the output face.
An apparatus for a coating process in which coating layers are provided on a surface of a substrate by successive surface reactions of at least two precursors according to the principles of atomic layer deposition, the apparatus comprises:
- a nozzle head having an output face provided with a precursor zone arranged to supply the at least two precursors to the surface of the substrate for providing a coating layer on the surface of the substrate;
- a precursor supply system for dosing the at least two precursors to the nozzle head and the precursor nozzles;
- and
- moving system for moving the nozzle head relative to the substrate in a relative moving direction for subjecting the surface of the substrate to successive surface reactions of the at least two precursors,
- the output face of the nozzle head having a width extending transversely to the relative moving direction of the nozzle head and the substrate and length extending in the relative moving direction of the nozzle head and the substrate;
- wherein the output face comprises at least two precursor zones arranged at different locations on the output face of the nozzle head in the direction of the width of the output face.
Dependencies are inferred from the claim text.