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US 2017/0362698 A1Published application
Vapor deposition mask, vapor deposition device, method for manufacturing vapor deposition mask, and vapor deposition method
AssigneeSharp Kabushiki Kaisha
InventorsYuhki KOBAYASHI, Shinichi KAWATO, Manabu NIBOSHI, Kazuo TAKIZAWA
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Abstract
A vapor deposition mask (10) has a fine-irregularities structure (14), provided on a contact surface of the vapor deposition mask (10), which is configured to attract, by van der Waals force, a film formation target substrate (30) so as to surround a plurality of apertures (12). The contact surface makes contact with the film formation target substrate (30).
Claims14
A vapor deposition mask having a plurality of apertures used to form a vapor deposition material on a film formation target substrate,
- said vapor deposition mask comprising:
- a fine-irregularities structure, provided on a contact surface of the vapor deposition mask, which is configured to attract, by van der Waals force, the film formation target substrate so as to surround the plurality of the apertures, the contact surface making contact with the film formation target substrate.
A method of producing a vapor deposition mask,
- the vapor deposition mask having a plurality of apertures used to form a vapor deposition material on a film formation target substrate,
- said vapor deposition mask comprising:
- a fine-irregularities structure, provided on a contact surface of the vapor deposition mask, which is configured to attract, by van der Waals force, the film formation target substrate so as to surround the plurality of the apertures, the contact surface making contact with the film formation target substrate,
- said method comprising the steps of:
- (a) forming the plurality of apertures in the vapor deposition mask;
- and
- (b) forming the fine-irregularities structure on the contact surface.
4 more elements
Dependencies are inferred from the claim text.