Deposition apparatus and deposition method
AssigneeNational Cheng Kung University
InventorsChi-Chuan HUANG, Chane-Yuan YANG, Tzu-Hsiang LIN
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Abstract
A deposition apparatus and a deposition method are described. The deposition apparatus includes an accommodating element, a plurality of lasers and a carrier. The accommodating element is configured to accommodate a material. The lasers are disposed at a periphery of the accommodating element, and are configured to simultaneously emit a plurality of laser beams toward the material to melt the material to form a deposition liquid. The carrier is disposed under the accommodating element and the lasers, and are configured to carry the deposition liquid.
Claims20
A deposition apparatus comprising:
- an accommodating element configured to accommodate a material;
- a plurality of lasers disposed at a periphery of the accommodating element, and configured to simultaneously emit a plurality of laser beams toward the material to melt the material into a deposition liquid;
- and
- a carrier disposed under the accommodating element and the lasers, and configured to carry the deposition liquid.
A deposition method comprising:
- supplying a material by using a material supplying hole in a bottom of an accommodating element;
- emitting a plurality of laser beams toward the material simultaneously under the bottom of the accommodating element to melt the material into a deposition liquid;
- and
- carrying the deposition liquid by using a carrier.
Dependencies are inferred from the claim text.