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US 2017/0361361 A1Published application
Apparatus for particle cleaning
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYING-HSUEH CHANG CHIEN, JAMES JENG-JYI HWANG, CHI-MING YANG
Life of this patent
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Abstract
The present disclosure provides a particle cleaning apparatus. The apparatus comprises an acoustic wave generator configured to apply an acoustic wave to particles external to the acoustic wave generator. The apparatus also includes a removing module configured to remove the applied particles.
Claims20
A particle cleaning apparatus, the apparatus comprising:
- an acoustic wave generator configured to apply an acoustic wave to particles external to the acoustic wave generator;
- and
- a removing module configured to remove the applied particles.
A semiconductor manufacturing system, the system comprising:
- a platen;
- an acoustic wave generator configured to generate an acoustic wave around the platen;
- and
- a removing module configured to draw particles off of the platen.
1 more element
An apparatus for cleaning particles, the apparatus comprising:
- an aperture configured to supply a fluid onto a workpiece;
- an acoustic wave generator configured to apply an acoustic wave onto the fluid;
- and
- a removing module configured to draw the fluid.
1 more element
Dependencies are inferred from the claim text.